Electrochemical Atomic Layer Etching of Ruthenium
نویسندگان
چکیده
منابع مشابه
Atomic-layer soft plasma etching of MoS2
Transition from multi-layer to monolayer and sub-monolayer thickness leads to the many exotic properties and distinctive applications of two-dimensional (2D) MoS2. This transition requires atomic-layer-precision thinning of bulk MoS2 without damaging the remaining layers, which presently remains elusive. Here we report a soft, selective and high-throughput atomic-layer-precision etching of MoS2...
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• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website. • The final author version ...
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ژورنال
عنوان ژورنال: Journal of The Electrochemical Society
سال: 2020
ISSN: 1945-7111
DOI: 10.1149/1945-7111/ab864b